Optimized parallel femtosecond-laser processing of computer-generated holograms allows for high-speed, high-light-use efficient 3D patterning.
Femtosecond-laser processing is important for simultaneously generating huge amounts of nanometer-sized structures. Combining a computer-generated hologram (CGH) with a spatial light modulator (SLM) provides important fabrication functions such as arbitrary and variable beam generation, spatial and temporal beam shaping, and adaptive wavefront correction. This approach is known as holographic femtosecond-laser processing.1–16 It offers high throughput and high light-use efficiency of the laser-pulse energy.
In this type of laser processing, precise control of diffraction peaks is essential for large-scale manufacturing. Computer-optimized holograms have highly uniform diffraction peaks a priori, but that uniformity decreases because of the optical system’s inherent spatial and temporal properties. The optimization level needs to be improved to obtain the desired diffraction peaks.
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